Miniaturized Transistors (Record no. 7648)
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000 -LEADER | |
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fixed length control field | 01966nam a2200121Ia 4500 |
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
fixed length control field | 220615s9999||||xx |||||||||||||| ||und|| |
100 ## - MAIN ENTRY--PERSONAL NAME | |
Personal name | Grasser, Tibor||Filipovic, Lado |
245 #0 - TITLE STATEMENT | |
Title | Miniaturized Transistors |
546 ## - LANGUAGE NOTE | |
Language note | English[eng] |
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM | |
Topical term or geographic name entry element | MOSFET||n/a||total ionizing dose (TID)||low power consumption||process simulation||two-dimensional material||negative-capacitance||power consumption||technology computer aided design (TCAD)||thin-film transistors (TFTs)||band-to-band tunneling (BTBT)||nanowires||inversion channel||metal oxide semiconductor field effect transistor (MOSFET)||spike-timing-dependent plasticity (STDP)||field effect transistor||segregation||systematic variations||Sentaurus TCAD||indium selenide||nanosheets||technology computer-aided design (TCAD)||high-? dielectric||subthreshold bias range||statistical variations||fin field effect transistor (FinFET)||compact models||non-equilibrium Green’s function||etching simulation||highly miniaturized transistor structure||compact model||silicon nanowire||surface potential||Silicon-Germanium source/drain (SiGe S/D)||nanowire||plasma-aided molecular beam epitaxy (MBE)||phonon scattering||mobility||silicon-on-insulator||drain engineered||device simulation||variability||semi-floating gate||synaptic transistor||neuromorphic system||theoretical model||CMOS||ferroelectrics||tunnel field-effect transistor (TFET)||SiGe||metal gate granularity||buried channel||ON-state||bulk NMOS devices||ambipolar||piezoelectrics||tunnel field effect transistor (TFET)||FinFETs||polarization||field-effect transistor||line edge roughness||random discrete dopants||radiation hardened by design (RHBD)||low energy||flux calculation||doping incorporation||low voltage||topography simulation||MOS devices||low-frequency noise||high-k||layout||level set||process variations||subthreshold||metal gate stack||electrostatic discharge (ESD) |
856 ## - ELECTRONIC LOCATION AND ACCESS | |
Uniform Resource Identifier | <a href="https://mdpi.com/books/pdfview/book/1370">https://mdpi.com/books/pdfview/book/1370</a> |
942 ## - ADDED ENTRY ELEMENTS (KOHA) | |
Koha item type | E-Books |
Withdrawn status | Lost status | Damaged status | Not for loan | Home library | Current library | Date acquired | Total Checkouts | Date last seen | Price effective from | Koha item type |
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Kerala University of Digital Sciences, Innovation and Technology Knowledge Centre | Kerala University of Digital Sciences, Innovation and Technology Knowledge Centre | 15/06/2022 | 15/06/2022 | 15/06/2022 | E-Books |